Publisher’s Note: “Optimization of Dislocation Edge Stress Effects for Si N-Type Metal–Oxide–Semiconductor Field-Effect Transistors”
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چکیده
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ژورنال
عنوان ژورنال: Japanese Journal of Applied Physics
سال: 2015
ISSN: 0021-4922,1347-4065
DOI: 10.7567/jjap.54.039205